Neff, Willi: search on Z-Library

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1

SPIE Proceedings [SPIE European Mask and Lithography Conf 2007 - Grenoble, France (Monday 22 January 2007)] 23rd European Mask and Lithography Conference - Status report on EUV source development and EUV source applications in EUVL

Bakshi, Vivek, Lebert, Rainer, Jägle, Bernhard, Wies, Christian, Stamm, Uwe, Kleinschmidt, Juergen, Schriever, Guido, Ziener, Christian, Corthout, Marc, Pankert, Joseph, Bergmann, Klaus, Neff, Willi,

Year:

2007

Language:

english

File:

PDF, 1.24 MB

english, 2007

2

Arc erosion characteristics of pseudospark discharge in multiaperture geometry

Naweed, Ahmer, Kiefer, Jochen, Gavrilescu, Constantin, Neff, Willi

Journal:

Journal of Applied Physics

Year:

2002

Language:

english

File:

PDF, 312 KB

english, 2002

3

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Extreme ultraviolet light generation based on laser-produced plasmas (LPP) and gas-discharge-based pinch plasmas: a comparison of different concepts

Schriever, Guido, Rahe, Manfred, Neff, Willi, Bergmann, Klaus, Lebert, Rainer, Lauth, Hans, Basting, Dirk, Dobisz, Elizabeth A.

Year:

2000

Language:

english

File:

PDF, 667 KB

english, 2000

4

[IEEE 2010 23rd Annual Meeting of the IEEE Photonics Society (Formerly LEOS Annual Meeting) - Denver, CO, USA (2010.11.7-2010.11.11)] 2010 IEEE Photinic Society's 23rd Annual Meeting - A hole-assisted erbium-doped fiber for bend-insensitive light amplification

Ha, Woosung, Park, Minkyu, Jeong, Yoonseob, Oh, Kyunghwan, Neff, Martin, Romano, Valerio, Luthy, Willy, Feurer, Thomas

Year:

2010

Language:

english

File:

PDF, 428 KB

english, 2010

5

Pinch-Plasma Radiation Source for Extreme-Ultraviolet Lithography with a Kilohertz Repetition Frequency

Bergmann, Klaus, Rosier, Oliver, Neff, Willi, Lebert, Rainer

Journal:

Year:

2000

Language:

english

File:

PDF, 94 KB

english, 2000

6

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Comparison of different source concepts for EUVL

Lebert, Rainer, Bergmann, Klaus, Juschkin, Larissa, Rosier, Oliver, Neff, Willi, Dobisz, Elizabeth A.

Year:

2001

Language:

english

File:

PDF, 139 KB

english, 2001

7

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Physical properties of the HCT EUV source

Pankert, Joseph, Bergmann, Klaus, Klein, J., Neff, Willi, Rosier, Oliver, Seiwert, Stefan, Smith, Christopher, Apetz, Rolf, Jonkers, Jeroen, Loeken, Michael, Derra, Guenther H., Engelstad, Roxann L.

Year:

2002

Language:

english

File:

PDF, 76 KB

english, 2002

8

Metal-doped fibres for broadband emission: Fabrication with granulated oxides

Martin Neff, Valerio Romano, Willy Lüthy

Journal:

Optical Materials

Year:

2008

Language:

english

File:

PDF, 339 KB

english, 2008

9

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - High-throughput EUV reflectometer for EUV mask blanks

Lebert, Rainer, Wies, Christian, Juschkin, Larissa, Jaegle, Bernhard, Meisen, Manfred, Aschke, Lutz, Sobel, Frank, Seitz, Holger, Scholze, Frank, Ulm, Gerhard, Walter, Konstantin, Neff, Willi, Bergman

Year:

2004

Language:

english

File:

PDF, 579 KB

english, 2004

10

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Physical properties of the HCT EUV source

Pankert, Joseph, Bergmann, Klaus, Klein, Juergen, Neff, Willi, Rosier, Oliver, Seiwert, Stefan, Smith, Christopher, Probst, Sven, Vaudrevange, Dominik, Siemons, Guido, Apetz, Rolf, Jonkers, Jeroen, Lo

Year:

2003

Language:

english

File:

PDF, 146 KB

english, 2003

11

Potential Effects of Reclassifying CKD as a Coronary Heart Disease Risk Equivalent in the US Population

Foster, Meredith C., Rawlings, Andreea M., Marrett, Elizabeth, Neff, David, Grams, Morgan E., Kasiske, Bertram L., Willis, Kerry, Inker, Lesley A., Coresh, Josef, Selvin, Elizabeth

Journal:

American Journal of Kidney Diseases

Year:

2014

Language:

english

File:

PDF, 411 KB

english, 2014

12

Cardiovascular risk factor burden, treatment, and control among adults with chronic kidney disease in the United States

Foster, Meredith C., Rawlings, Andreea M., Marrett, Elizabeth, Neff, David, Willis, Kerry, Inker, Lesley A., Coresh, Josef, Selvin, Elizabeth

Journal:

American Heart Journal

Year:

2013

Language:

english

File:

PDF, 179 KB

english, 2013

13

The influence of ignition and in-cylinder flow on the combustion of highly diluted mixtures in SI engines

Stefan Pischinger,José Geiger,Robert Böwing,Willi Neff,Hans-Jürgen Koß…

Journal:

MTZ worldwide eMagazine

Year:

2002

Language:

english

File:

PDF, 303 KB

english, 2002

14

A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography

Klaus Bergmann, Oliver Rosier, Rainer Lebert, Willi Neff, Reinhart Poprawe

Journal:

Microelectronic Engineering

Year:

2001

Language:

english

File:

PDF, 353 KB

english, 2001

15

SPIE Proceedings [SPIE SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation - San Diego, CA (Sunday 11 July 1993)] Applications of Laser Plasma Radiation - Laser and pinch plasma x-ray sources for microscopy and lithography

Neff, Willi, Rothweiler, D., Eidmann, Klaus, Lebert, Rainer, Richter, Franz, Winhart, G., Richardson, Martin C.

Year:

1994

Language:

english

File:

PDF, 643 KB

english, 1994

16

SPIE Proceedings [SPIE International Symposium on Optical Science and Technology - San Diego, CA (Sunday 30 July 2000)] Soft X-Ray and EUV Imaging Systems - Extreme-ultraviolet source development: a comparison of different concepts

Schriever, Guido, Rahe, Manfred, Rebhan, Ulrich, Basting, Dirk, Walecki, Wojciech J., Lauth, Hans, Lebert, Rainer, Bergmann, Klaus, Hoffmann, Dieter, Rosier, Oliver, Neff, Willi, Poprawe, Reinhart, Sa

Year:

2000

Language:

english

File:

PDF, 572 KB

english, 2000

17

Reconstructing past fire regimes: methods, applications, and relevance to fire management and conservation

Marco Conedera, Willy Tinner, Christophe Neff, Manfred Meurer, Angela F. Dickens, Patrik Krebs

Journal:

Quaternary Science Reviews

Year:

2009

Language:

english

File:

PDF, 2.09 MB

english, 2009

18

SPIE Proceedings [SPIE 21st European Mask and Lithography Conference - Dresden, Germany (Thursday 16 June 2005)] 21st European Mask and Lithography Conference - Progress on EUV-source development, tool integration and applications

Lebert, Rainer, Jagle, Bernhard, Wies, Christian, Stamm, Uwe, Kleinschmidt, Juergen, Gaebel, Kai, Schriever, Guido, Pankert, Joseph, Bergmann, Klaus, Neff, Willi, Egbert, Andre

Year:

2005

Language:

english

File:

PDF, 1.38 MB

english, 2005

19

One Step Creation of Multifunctional 3D Architectured Hydrogels Inducing Bone Regeneration

Neffe, Axel T., Pierce, Benjamin F., Tronci, Giuseppe, Ma, Nan, Pittermann, Erik, Gebauer, Tim, Frank, Oliver, Schossig, Michael, Xu, Xun, Willie, Bettina M., Forner, Michèle, Ellinghaus, Agnes, Liena

Journal:

Advanced Materials

Year:

2015

Language:

english

File:

PDF, 1.86 MB

english, 2015

20

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Sn DPP source-collector modules: status of alpha resources, beta developments, and the scalability to HVM

Corthout, Marc, Schellenberg, Frank M., Apetz, Rolf, Brudermann, Jesko, Damen, Marcel, Derra, Günther, Franken, Oliver, Jonkers, Jeroen, Klein, Jürgen, Küpper, Felix, Mader, Arnaud, Neff, Willi, Scheu

Year:

2008

Language:

english

File:

PDF, 2.08 MB

english, 2008

21

Hydrogels: One Step Creation of Multifunctional 3D Architectured Hydrogels Inducing Bone Regeneration (Adv. Mater. 10/2015)

Neffe, Axel T., Pierce, Benjamin F., Tronci, Giuseppe, Ma, Nan, Pittermann, Erik, Gebauer, Tim, Frank, Oliver, Schossig, Michael, Xu, Xun, Willie, Bettina M., Forner, Michèle, Ellinghaus, Agnes, Liena

Journal:

Advanced Materials

Year:

2015

File:

PDF, 1.51 MB

2015

22

Highly Repetitive, Extreme-Ultraviolet Radiation Source Based on a Gas-Discharge Plasma

Bergmann, Klaus, Schriever, Guido, Rosier, Oliver, Müller, Martin, Neff, Willi, Lebert, Rainer

Journal:

Year:

1999

Language:

english

File:

PDF, 112 KB

english, 1999

23

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Emerging Lithographic Technologies IX - Integrating Philips' extreme UV source in the alpha-tools

Pankert, Joseph, Apetz, Rolf, Bergmann, Klaus, Derra, Guenther, Janssen, Maurice, Jonkers, Jeroen, Klein, Jurgen, Kruecken, Thomas, List, Andreas, Loeken, Michael, Metzmacher, Christof, Neff, Willi, P

Year:

2005

Language:

english

File:

PDF, 294 KB

english, 2005

24

SPIE Proceedings [SPIE Optical Science and Technology, the SPIE 49th Annual Meeting - Denver, CO (Monday 2 August 2004)] Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications II - Design and development of an optical system for EUV-microscopy

Foltyn, Thomas, Khounsary, Ali M., Dinger, Udo, Bergmann, Klaus, Braun, Stefan, Ota, Kazuya, Gawlitza, Peter, Leson, Andreas, Neff, Willy, Walter, Konstantin

Year:

2004

File:

PDF, 425 KB

2004

25

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Status of Philips' extreme UV source

Pankert, Joseph, Mackay, R. Scott, Bergmann, Klaus, Klein, Juergen, Neff, Willi, Rosier, Oliver, Seiwert, Stefan, Smith, Christopher, Probst, Sven, Vaudrevange, Dominik, Siemons, Guido, Apetz, Rolf, J

Year:

2004

Language:

english

File:

PDF, 374 KB

english, 2004

26

[IEEE SoutheastCon 2019 - Huntsville, AL, USA (2019.4.11-2019.4.14)] 2019 SoutheastCon - Measuring Compute-Reuse Opportunities for Video Processing Acceleration

Willis, Andrew, Tabkhi, Hamed, Mendieta, Matias, Neff, Christopher

Year:

2019

File:

PDF, 1.78 MB

2019

27

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Status of EUV-lamp development and demonstration of applications

Lebert, Rainer, Wies, Christian, Jaegle, Bernhard, Juschkin, Larissa, Bieberle, Ulrich, Meisen, Manfred, Neff, Willi, Bergmann, Klaus, Walter, Konstantin, Rosier, Oliver, Schuermann, Max C., Missalla,

Year:

2004

Language:

english

File:

PDF, 1.54 MB

english, 2004

28

The magnitude of the snow-sourced reactive nitrogen flux to the boundary layer in the Uintah Basin, Utah, USA

Zatko, Maria, Erbland, Joseph, Savarino, Joel, Geng, Lei, Easley, Lauren, Schauer, Andrew, Bates, Timothy, Quinn, Patricia K., Light, Bonnie, Morison, David, Osthoff, Hans D., Lyman, Seth, Neff, Willi

Journal:

Atmospheric Chemistry and Physics

Year:

2016

Language:

english

File:

PDF, 4.37 MB

english, 2016

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